OPTICAL SYSTEM, PROJECTION EXPOSURE SYSTEM AND METHOD
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United States of America Patent
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Issued Date -
Aug 29, 2024
app pub date -
May 7, 2024
filing date -
Nov 18, 2021
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Abstract
An optical system for a projection exposure apparatus comprises: an obscuration stop, a stop for the numerical aperture or an extraneous light stop, at least portions of which are arranged in a beam path of the optical system to shade at least portions of the beam path; a heating device for introducing heat into the stop, the stop being deformable from an initial geometry into a design geometry with the aid of the introduction of the heat; and a temperature sensor, a photo element and/or an infrared camera.
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