REFLECTIVE PHOTOMASK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Aug 29, 2024
app pub date -
Jun 2, 2022
filing date -
Jun 17, 2021
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
There are provided a reflective photomask capable of reducing the shadowing effect and a method for manufacturing the reflective photomask. A reflective photomask (100) according to one aspect of the present disclosure includes: a substrate (11)); a reflective layer (12) having a multi-layer film structure formed on the substrate (11) and configured to reflect an EUV light; a protective layer (13) formed on the reflective layer (12) and configured to protect the reflective layer (12); and an absorption pattern layer (14a) formed on the protective layer (13) and formed with a pattern and configured to absorb the EUV light; in which the absorption pattern layer (14a) contains a material having an extinction coefficient k to the EUV light larger than 0.041, and a side wall angle θ formed by the side wall of the absorption pattern layer (14a) and the substrate (11) is less than 90°.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully