GAS SUPPLY FOR A PLASMA ARC MATERIAL PROCESSING SYSTEM
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United States of America Patent
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Issued Date -
Aug 22, 2024
app pub date -
Feb 22, 2024
filing date -
Feb 22, 2023
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
A gas supply system is provided for a gas-cooled plasma arc material processing system. The gas supply system includes a gas pressure control valve disposed relative to a gas-cooled plasma arc torch in the plasma arc material processing system and a gas selector valve fluidly connected to (i) at least two gas supplies and (ii) a torch lead coupled to the plasma arc torch. The gas selector valve located upstream from both the torch lead and the gas pressure control valve. The gas supply system also includes a switching device operably connected to the gas selector valve. The switching device is configured to manipulate a position of the gas selector valve to supply a gas from one of the at least two gas supplies to the plasma arc torch via the lead.
First Claim
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