SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY
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United States of America Patent
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Issued Date -
Aug 22, 2024
app pub date -
May 3, 2024
filing date -
Jan 5, 2017
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Abstract
A substrate support for supporting a substrate in a substrate processing system includes a baseplate and a ceramic layer arranged above the baseplate. An outer perimeter of the ceramic layer is surrounded by an edge ring. An outer radius of the ceramic layer is greater than an inner radius of the edge ring such that an outer edge of the ceramic layer extends below the edge ring.
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