PLASMA-RESISTANT GLASS, CHAMBER INTERIOR PARTS FOR SEMICONDUCTOR MANUFACTURING PROCESS, AND METHODS FOR MANUFACTURING SAME

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United States of America Patent

APP PUB NO 20240274410A1
SERIAL NO

18566335

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention relates to a plasma-resistant glass, chamber interior parts for a semiconductor manufacturing process, and methods for manufacturing same, and specifically, to a plasma-resistant glass and a method for manufacturing same, wherein the content of components of the plasma-resistant glass can be controlled to reduce the thermal expansion coefficient of the glass and thereby prevent the glass from being damaged due to thermal shock when used at a high-temperature.

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Patent Owner(s)

Patent OwnerAddress
HANSOL IONES CO LTD2061 ANSEONG-DAERO GOSAM MYEON GYEONGGI-DO ANSEONG-SI 17505

International Classification(s)

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  • 2022 Application Filing Year
  • H01J Class
  • 2261 Applications Filed
  • 741 Patents Issued To-Date
  • 32.78 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20222023202420250255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Dae Gun Osan-si, KR 17 8
Lee, KyungMin Hwaseong-si, KR 102 526
Lee, Mun ki Suwon-si, KR 6 5
Na, Hye In Hwaseong-si, KR 1 0
Seok, Hye Won Osan-si, KR 5 3

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges397216101 - 10025050075010001250150017502000225025002750300032503500375040004250

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