SUBSTRATE TREATMENT APPARATUS

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United States of America Patent

APP PUB NO 20240272562A1
SERIAL NO

18644211

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Abstract

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A substrate treatment apparatus, comprising: a coating device configured to coat a substrate, which is conveyed at a first speed in a feeding direction, with a material; a drying device configured to receive the substrate, which is coated by means of the coating device, at the first speed and dry the material; an exposure device configured to receive the substrate, which is dried by means of the drying device, at the first speed and continuously convey a mask at the first speed in the feeding direction, the mask being used for regional shading during exposure of the material by means of the exposure device; and an etching device configured to receive the substrate, which is exposed by means of the exposure device, at the first speed and etch the material and a portion of the substrate in an unexposed region of the substrate.

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Patent Owner(s)

Patent OwnerAddress
CONTEMPORARY AMPEREX TECHNOLOGY (HONG KONG) LIMITEDLEVEL 19 CHINA BUILDING 29 QUEEN'S ROAD CENTRAL CENTRAL CENTRAL AND WESTERN DISTRICT HONG KONG

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
LI, Keqiang Ningde, CN 55 85
LIU, Xiaosong Ningde, CN 20 10
LU, Yi Ningde, CN 273 2581
WU, Zhiyang Ningde, CN 25 4

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