MODULE FOR MEASURING CURRENT/VOLTAGE/POWER OF PLASMA APPARATUS AND PLASMA APPARATUS INCLUDING THE SAME
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United States of America Patent
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Issued Date -
Aug 8, 2024
app pub date -
Jan 30, 2024
filing date -
Feb 6, 2023
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Abstract
Provided is a module for measuring current/voltage/power of a plasma apparatus, which includes a process chamber having a sealed processing space in which plasma is formed to process a substrate; a substrate support unit disposed in the processing space and on which a substrate is seated; and a gas injection unit configured to inject gas for performing a process in the processing space, wherein, in a substrate processing apparatus configured to process the substrate by applying RF power to the process chamber, the gas support unit, and the gas injection unit, the module for measuring current/voltage/power of the plasma apparatus is disposed adjacent to at least one application line among a first power application line for applying the RF power and a ground line for grounding to measure a RF voltage, current, and power of an input wave and a reflected wave generated by plasma generated in the processing space.
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