ATOMIC LAYER DEPOSITION APPARATUS
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United States of America Patent
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Issued Date -
Aug 8, 2024
app pub date -
Oct 2, 2023
filing date -
Feb 6, 2023
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Abstract
An atomic layer deposition apparatus includes a source gas supply part that supplies multiple source gases, a source gas supply module connected to the source gas supply part, a reaction gas supply part that supplies a reaction gas, a reaction gas supply module connected to the reaction gas supply part and spaced apart from the source gas supply module in a first direction, and a first purge gas supply module disposed between the source gas supply module and the reaction gas supply module.
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