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Abstract

A method of manufacturing a silicon optical member includes: providing a silicon substrate having a first primary surface and a second primary surface; forming a mask pattern on the first primary surface; forming one or more inclined surfaces by wet etching the silicon substrate from the first primary surface using the mask pattern as a mask; forming a third primary surface at a location closer to the first primary surface than to the second primary surface by partially removing the silicon substrate from the second primary surface toward the first primary surface without reaching the one or more inclined surfaces while the silicon substrate is supported at the first primary surface; and singulating the silicon substrate into a plurality of silicon optical members such that each of the plurality of silicon optical members includes the third primary surface and at least one of the one or more inclined surfaces.

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First Claim