Substrate with Film for Reflective Mask Blank, and Reflective Mask Blank
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United States of America Patent
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Jul 25, 2024
app pub date -
Nov 9, 2023
filing date -
Apr 28, 2020
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Abstract
A substrate with a film for a reflective mask blank and a reflective mask blank, including a substrate, a multilayer reflection film of Mo layers and Si layers, and a Ru protection film is provided. The substrate and blank include a mixing layer containing Mo and Si existing between the Mo layer and Si layer, another mixing layer containing Ru and Si generating between the uppermost Si layer and the Ru protection film, the film and layers have thicknesses satisfying defined expressions.
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