METHOD OF FORMING AN AQUEOUS POLYMER COMPOSITION
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United States of America Patent
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Issued Date -
Jul 25, 2024
app pub date -
Jan 23, 2023
filing date -
Jan 23, 2023
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Abstract
Embodiments of the disclosure relate to a substrate etching system and process. A method may include generating a first solution comprising a first polymer resin and a second polymer resin, receiving a second solution comprising the first polymer resin and a third solution comprising the second polymer resin, assessing a viscosity of the first solution, and adjusting the viscosity using the second solution and the third solution according to a downstream viscosity range.
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