SCANNING ELECTRON MICROSCOPE IMAGE DISTORTION CORRECTION METHOD, AND SEMICONDUCTOR MANUFACTURING METHOD USING THE CORRECTION METHOD
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United States of America Patent
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Issued Date -
Jul 18, 2024
app pub date -
Dec 4, 2023
filing date -
Jan 18, 2023
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Abstract
An scanning electron microscope (SEM) image distortion correction method includes obtaining at least one SEM image of holes provided on a wafer in a two-dimensional array structure, the holes including at least one central hole within a central region of the at least one SEM image and a plurality of peripheral holes outside the central region, expanding each of the plurality of peripheral holes in a minor axis direction such that a ratio of a minor axis to a major axis of each of the plurality of peripheral holes is about 1:1, and expanding each of the plurality of peripheral holes in multiple directions in the at least one SEM image such that a diameter of the at least one central hole and a diameter of at least one of the plurality of peripheral holes are substantially equal to each other.
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