PHOTOMASKS HAVING INTERMEDIATE BARRIER LAYERS
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United States of America Patent
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Issued Date -
Jul 18, 2024
app pub date -
Mar 28, 2024
filing date -
Mar 28, 2024
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Abstract
Photomasks having intermediate barrier layers are disclosed. An example photomask comprises a substrate including a multilayer region, the multilayer region including alternating layers of a first material and a second material different from the first material, a capping layer, and an intermediate layer separating the capping layer and the substrate, the intermediate layer including a third material different from the first material and different from the second material.
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