MEASUREMENT APPARATUS, MEASURING METHOD, AND MANUFACTURING METHOD OF OPTICAL SYSTEM
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United States of America Patent
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Issued Date -
Jul 18, 2024
app pub date -
Dec 15, 2023
filing date -
Jan 13, 2023
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Abstract
A measurement apparatus includes a measurement optical system configured to make first light emitted from a chart enter a tested optical system, an image sensor configured to receive the first light, an adjusting unit configured to adjust relative positions of the measurement optical system and the tested optical system, an interferometer configured to acquire an interference signal by causing interference between reference light and test light, a correction unit configured to correct a condensing position deviation between the first light and the test light, and an acquiring unit configured to acquire an optical path length from the first point to the plurality of test surfaces based on the interference signal, and a distance between adjacent test surfaces among the plurality of test surfaces based on the optical path length.
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