DEUTERIUM RECOVERY METHOD AND DEUTERIUM RECOVERY EQUIPMENT
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United States of America Patent
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Jul 18, 2024
app pub date -
Jul 14, 2022
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Aug 25, 2021
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Abstract
An object of the present invention is to provide a deuterium recovery method and deuterium recovery equipment that can recover and reuse deuterium or deuterium compounds used in semiconductor manufacturing processes. The present invention provides a deuterium recovery method including: generating heavy water in an exhaust gas containing deuterium gas in a semiconductor manufacturing process.
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