METHOD FOR WASHING DISPENSING PROBE INCLUDED IN AUTOMATED ANALYZER, AND AUTOMATED ANALYZER

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United States of America Patent

APP PUB NO 20240230700A1
SERIAL NO

18000540

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An object of the invention is to provide a technique capable of enhancing a cleaning effect of a dispensing probe while preventing an influence on an analysis throughput. In a method according to the invention, an inner surface of a dispensing probe is cleaned by repeating an inner surface liquid-feeding period in which a cleaning liquid is fed to an inside of the dispensing probe and an inner surface stop period in which the cleaning liquid is not fed.

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Patent Owner(s)

Patent OwnerAddress
HITACHI HIGH-TECH CORPORATIONTOKYO 105-6409

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirano, Masaaki Tokyo, JP 133 963
Horie, Yosuke Tokyo, JP 17 27
Miyake, Yuka Tokyo, JP 9 7
Mori, Takamichi Tokyo, JP 53 109
Nojima, Akihiro Tokyo, JP 25 31
Takada, Eiichiro Tokyo, JP 38 29

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