INFRARED SENSOR AND ITS REFERENCE ELEMENT AND MANUFACTURING METHOD OF THE REFERENCE ELEMENT

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United States of America Patent

APP PUB NO 20240230413A1
SERIAL NO

18094334

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Abstract

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A reference element of an infrared sensor includes a substrate, a sacrificial layer, a supporting structure, a fence structure and an infrared sensing structure. The sacrificial layer is disposed on the substrate. The supporting structure is disposed on the substrate wherein the top surface of the supporting structure is coplanar with the top surface of the sacrificial layer. The fence structure is disposed on the substrate and surrounds the sacrificial layer wherein the top surface of the fence structure is coplanar with the top surface of the sacrificial layer, and there is an air gap between the fence structure and the supporting structure. The infrared sensing structure is disposed on the sacrificial layer, the supporting structure and the fence structure, and the infrared sensing structure has an opening corresponding to the air gap.

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Patent Owner(s)

Patent OwnerAddress
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE195 SEC 4 CHUNG HSING RD CHUTUNG HSINCHU 310401

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHEN, Ming-Fa Taoyuan City, TW 524 4489
KUO, Chin-Jou Tainan City, TW 4 0
LEE, Bor-Shiun New Taipei City, TW 19 8
LIN, Kun-Chuan Tainan City, TW 15 384

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