METHOD OF REMOVING DEFECT OF MASK
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United States of America Patent
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Issued Date -
Jul 4, 2024
app pub date -
Nov 29, 2023
filing date -
Jan 3, 2023
priority date (Note) -
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status (Latency Note)
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Abstract
A method of removing a defect of a mask may include generating a probe profile, the probe profile including characteristics of a probe of an atomic force microscope (AFM); generating a design-based reference image of a defect area by applying the probe profile to a design image of the defect area of the mask including a location of the defect; obtaining an AFM image of the defect area by scanning the defect area of the mask using the probe of the AFM; recognizing the defect as a recognized defect by comparing the AFM image of the defect area with the design-based reference image; and removing the recognized defect using the probe of the AFM.
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