LASER BEAM METROLOGY SYSTEM, LASER BEAM SYSTEM, EUV RADIATION SOURCE, AND LITHOGRAPHIC APPARATUS
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United States of America Patent
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Jun 27, 2024
app pub date -
Mar 29, 2022
filing date -
Apr 29, 2021
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Abstract
A laser beam metrology system (500) configured to co-operate with a laser beam system that is configured to sequentially direct a first laser beam pulse and a second laser beam pulse (430) to a target along two independent optical paths, the laser beam metrology system comprising a beam steering device (470) and a detection system (510). A laser beam system comprising the laser beam metrology system and a EUV source is also described.
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