HIGH-VOLTAGE TRANSISTOR WITH THIN HIGH-K METAL GATE AND METHOD OF FABRICATION THEREOF
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United States of America Patent
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Issued Date -
Jun 20, 2024
app pub date -
Feb 29, 2024
filing date -
Feb 29, 2024
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Abstract
A semiconductor device and methods of fabrication the same are disclosed. In one embodiment, the semiconductor device may include a non-volatile memory (NVM) cell including a memory gate stack and a select gate stack separated by an inter-gate dielectric disposed in a memory region of a substrate, a low voltage field-effect transistor (LVFET) including a first high-K metal-gate (HKMG) stack disposed in a peripheral region of the substrate, and a high voltage field-effect transistor (HVFET) including a second HKMG stack disposed in the peripheral region, in which top surfaces of the memory gate stack and the select gate stack of the NVM cell, the LVFET, and the HVFET have an approximately same elevation from the substrate or are substantially co-planar. Other embodiments are also disclosed within.
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