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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
APPLIED MATERIALS INC	3050 BOWERS AVENUE SANTA CLARA CALIFORNIA 95054

International Classification(s)

• H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Ailihumaer, Tuerxun	Santa Clara, US	12	0
Chen, Shih Chung	Cupertino, US	48	518
Devrajan, Janardhan	Santa Clara, US	8	1
Gandikota, Srinivas	Santa Clara, US	214	6856
Lei, Yu	Belmont, US	136	1885
Lin, Yongjing	San Jose, US	28	81
Liu, Zhihui	Sunnyvale, US	35	95
Ma, Tengzhou	San Jose, US	8	0
Sriram, Mandyam	San Jose, US	77	7695
Xu, Yi	San Jose, US	319	2238
Yang, Yixiong	Fremont, US	90	569
Zheng, Yuanhua	Burlingame, US	5	1

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
3.5 Year Payment	$1600.00	$800.00	$400.00	Dec 20, 2027
7.5 Year Payment	$3600.00	$1800.00	$900.00	Dec 20, 2031
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Dec 20, 2035

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 3.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 7.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

Full Text

US Patent Application No: 2024/0204,061

METHOD OF REDUCING METAL GATE RESISTANCE FOR NEXT GENERATION NMOS DEVICE APPLICATION

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