ELECTROSTATIC CHUCK HEATER AND FILM DEPOSITION APPARATUS
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United States of America Patent
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Issued Date -
Jun 20, 2024
app pub date -
May 12, 2023
filing date -
May 12, 2023
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Abstract
There is provided an electrostatic chuck heater including: a ceramic plate having a first surface for bearing a wafer on which a film is to be deposited, and a second surface opposite the first surface, and including ESC electrodes and a heater electrode which are built therein; a ceramic shaft which is attached to the second surface of the ceramic plate and which comprises an internal space for accommodating an ESC rod connected to the ESC electrodes and a heater rod connected to the heater electrode; a plurality of lift pin holes penetrating the ceramic plate from the first surface to the second surface; and a plurality of protrusions arranged on the first surface of the ceramic plate with equal spacing from each other and with rotational symmetry about a central axis of each of the lift pin holes.
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