PHOTOSENSITIVE SURFACE TREATMENT AGENT, LAMINATE, TRANSISTOR, METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING TRANSISTOR

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United States of America Patent

APP PUB NO 20240201575A1
SERIAL NO

18443248

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Abstract

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A photosensitive surface treatment agent containing a compound represented by the following formula (1) or a polymer compound derived from the following formula (1).

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Patent Owner(s)

Patent OwnerAddress
NIKON CORPORATION1-5-20 NISHIOI SHINAGAWA-KU TOKYO 140-8601

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ITOU, Michiko Yokohama-shi, JP 3 0
KAWAKAMI, Yusuke Yokohama-shi, JP 59 667
YAMAGUCHI, Kazuo Mitaka-shi, JP 96 1280

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