CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
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United States of America Patent
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Issued Date -
Jun 13, 2024
app pub date -
Oct 4, 2023
filing date -
Oct 19, 2022
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Abstract
A chemically amplified resist composition is provided comprising (A) a polymer adapted to increase its solubility in an aqueous alkaline under the action of an acid, the polymer comprising repeat units, represented by the formula (A1), and repeat units, represented by the formula (B1), and lacking repeat units adapted to generate an acid upon exposure, and (B) a photoacid generator represented by the formula (PAG-a) or (PAG-b) which generates an acid under the action of KrF excimer laser, ArF excimer laser, electron beams or extreme ultraviolet radiation.
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