PHOTOMASK INCLUDING MONITORING MARK
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United States of America Patent
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Issued Date -
Jun 13, 2024
app pub date -
Aug 23, 2023
filing date -
Dec 12, 2022
priority date (Note) -
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status (Latency Note)
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Abstract
A photomask includes: a base, a pattern layer disposed on the base, and a monitoring mark including a first sub-monitoring mark which includes a plurality of test patterns defined as openings penetrating the base and the pattern layer. The first sub-monitoring mark includes first through n-th test patterns, each of the first through n-th test patterns includes a first edge and a second edge extending along a first direction and facing each other along a second direction different from the first direction, the second edge of a j-th test pattern among the first through n-th test patterns is spaced apart from the first edge of the j-th test pattern along the second direction by (kn+j) times a unit width that is constant along the second direction, and n is a natural number more than 1, j is a natural number from 1 to n, and k is a natural number.
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