SUBSTRATE PROCESSING APPARATUS AND CLEANING METHOD
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United States of America Patent
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Issued Date -
May 30, 2024
app pub date -
Nov 16, 2023
filing date -
Nov 28, 2022
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Abstract
Provided is a substrate processing apparatus comprising a processing chamber, a rotatable substrate support configured to hold a substrate in the processing chamber, a freezing device that is in contact with or separated from the substrate support and is configured to cool the substrate support, a mechanism configured to rotate the substrate support and raise and lower the freezing device, a power supply part configured to supply a radio frequency (RF) power, and a power supply line that penetrates through the freezing device, has a contact portion, and is configured to switch supply and stop of supply of the RF power by connecting the contact portion to a specific position of the substrate support or disconnecting the contact portion from the specific position of the substrate support.
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