REFLECTIVE MASK BLANK AND REFLECTIVE MASK
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United States of America Patent
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Issued Date -
May 30, 2024
app pub date -
Jan 19, 2024
filing date -
Oct 29, 2019
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Abstract
A reflective mask blank includes a substrate and, on or above the substrate in order, a reflective layer for reflecting EUV light, a protective layer for protecting the reflective layer, and an absorbent layer for absorbing EUV light. The absorbent layer has a reflectance for a wavelength of 13.53 nm of from 2.5% to 10% and consists of a lower absorption layer and an upper absorption layer. A film thickness dbi of the absorbent layer satisfies a relationship of:
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