SUBSTRATE SURFACE TREATING SOLUTION, AND USING THE SAME, METHOD FOR MANUFACTURING CLEANED SUBSTRATE AND METHOD FOR MANUFACTURING DEVICE
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United States of America Patent
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Issued Date -
May 30, 2024
app pub date -
Mar 8, 2022
filing date -
Mar 11, 2021
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Abstract
To provide a substrate surface treating solution for efficiently cleaning a substrate. [Means for Solution] The substrate surface treating solution according to the present invention is a substrate surface treating solution comprising a basic compound (A) and a solvent (B), and the substrate surface treating solution is applied on a substrate to form a substrate surface treatment layer containing at least a part of the basic compound (A), and a substrate cleaning solution is applied on the substrate surface treatment layer and used for forming a substrate cleaning film.
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