PHOTOMASK, DISPLAY DEVICE, AND MANUFACTURING METHOD THEREOF
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United States of America Patent
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May 23, 2024
app pub date -
Jan 25, 2024
filing date -
Mar 25, 2020
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Abstract
A photomask according to an exemplary embodiment includes: a mask substrate; and a first test pattern and a second test pattern disposed along a first edge of the mask substrate, wherein the first test pattern has a first outer shape and a first inner shape, the second test pattern has a second outer shape, and the second outer shape of the second test pattern is larger than the first inner shape of the first test pattern and smaller than the first outer shape of the first test pattern.
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