IN-LINE ANGULAR OPTICAL MULTI-POINT SCATTEROMETRY FOR NANOMANUFACTURING SYSTEMS
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United States of America Patent
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Issued Date -
May 16, 2024
app pub date -
Oct 30, 2020
filing date -
Nov 1, 2019
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Abstract
A method and system for high-speed 2Θ multi-point scatterometry is disclosed. The method includes directing a laser beam from a laser light source to a collimation optical system that collimates the laser beam to a collimated laser beam; adjusting a polarization of the collimated laser beam using a polarization control optics; directing the collimated laser beam that is polarized by a first optical system to illuminate a focal area on a sample surface; receiving reflected light from the focus of the laser light source at the sample surface by a second optical system; detecting the reflected light by a detector system to produce detection signals; and processing the detection signals to measure parameters of the sample surface.
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