MEMS RESONATOR AND MEMS RESONATOR PROCESSING METHOD

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United States of America Patent

APP PUB NO 20240154598A1
SERIAL NO

18550628

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Abstract

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The present disclosure relates to a micro electro mechanical system (MEMS) resonator. An example MEMS resonator includes a substrate, a barrier layer, a conducting layer, a dielectric isolation layer, a harmonic oscillator, a first electrical isolation structure, and a first conducting structure. The substrate and the barrier layer are combined to form a cavity, and a junction between the substrate and the barrier layer includes the conducting layer. The dielectric isolation layer is included between the conducting layer and the barrier layer. The harmonic oscillator is connected to the conducting layer and is suspended in the cavity. The conducting layer is connected to a first conducting structure that is outside the barrier layer, and a first electrical isolation structure is included between the first conducting structure and the barrier layer. The barrier layer and the dielectric isolation layer are configured to isolate the first electrical isolation structure from the cavity.

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Patent Owner(s)

Patent OwnerAddress
HUAWEI TECHNOLOGIES CO LTD518129 BANTIAN HUAWEI HEADQUARTERS OFFICE BUILDING LONGGANG DISTRICT GUANGDONG SHENZHEN SHENZHEN CITY GUANGDONG PROVINCE 518129

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHEN, Wen Wuhan, CN 156 1026
FENG, Zhihong Wuhan, CN 30 38
HAN, Jinzhao Wuhan, CN 1 0
WU, Guoqiang Wuhan, CN 39 49

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