METHOD AND SYSTEM FOR PREDICTING PROCESS INFORMATION WITH A PARAMETERIZED MODEL

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United States of America Patent

APP PUB NO 20240152060A1
SERIAL NO

18282305

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Abstract

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A method and system for predicting process information (e.g., phase data) using a given input (e.g., intensity) to a parameterized model are described. A latent space of a given input is determined based on dimensional data in a latent space of the parameterized model for a given input to the parameterized model. Further, an optimum latent space is determined by constraining the latent space with prior information (e.g., wavelength) that enables converging to a solution that causes more accurate predictions of the process information. The optimum latent space is used to predict the process information. The given input may be a measured amplitude (e.g., intensity) associated with the complex electric field image. The predicted process information can be complex electric field image having amplitude data and phase data. The parameterized model comprises variational encoder-decoder architecture.

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ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HELFENSTEIN, Patrick Philipp Eindhoven, NL 5 1
KONIJNENBERG, Alexander Prasetya Veldhoven, NL 7 8
MIDDLEBROOKS, Scott Anderson Duizel, NL 65 521
PISARENCO, Maxim Son en Breugel, NL 39 119
VAN, KRAAIJ Markus Gerardus Martinus Maria Eindhoven, NL 41 234

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