Systems, methods, and devices for generating predominantly radially expanded plasma flow
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United States of America Patent
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Aug 6, 2024
Grant Date -
May 2, 2024
app pub date -
Dec 13, 2023
filing date -
Aug 28, 2020
priority date (Note) -
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Abstract
Systems, devices, and methods generating a plasma flow are disclosed. A method may include applying energy that alternates between being at a base level for a first duration and at a pulse level for a second duration according to a controlled pattern, generating a plasma flow having a directional axis, and discharging the plasma flow alternating between a base configuration and a pulse configuration according to the controlled pattern. The plasma flow in the base configuration may have (1) a first temperature at the outlet and (2) a first flow front that advances along the directional axis. The plasma flow in the pulse configuration may have (1) a second temperature at the outlet that is greater than the first temperature and (2) a second flow front that advances along the directional axis at a speed greater than the first flow front.
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