RESONANCE DEVICE AND METHOD FOR MANUFACTURING SAME
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United States of America Patent
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N/A
Issued Date -
Apr 18, 2024
app pub date -
Dec 28, 2023
filing date -
Jul 29, 2021
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
A resonance device that includes: a first substrate having a first silicon substrate and a resonator, wherein the resonator includes a single-crystal silicon film and a first silicon oxide film interposed between the single-crystal silicon film and the first silicon substrate, and a through hole that passes through the single-crystal silicon film and the first silicon oxide film; a second substrate opposite the first substrate; a frame shaped bonding portion that bonds the first substrate to the second substrate to seal a vibration space of the resonator; and a first blocking member disposed in an interior of the through hole and surrounding a vibration portion of the resonator in a plan view of the first substrate so as to divide the first silicon oxide film, wherein the first blocking member has a lower helium permeability than the first silicon oxide film.
First Claim
Other Claims data not available