Importance

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Abstract

There are provided a reflective photomask and a reflective photomask blank having a high contrast of a minute pattern to an inspection light and capable of minimizing the shadowing effect in EUV exposure. A reflective photomask blank (100) of this embodiment includes: a substrate (11); a reflective part (17); and a low reflective part (18), in which the low reflective part (18) is a multi-layer structural body having at least two or more layers including an absorption layer (14) and an outermost layer (15), an extinction coefficient k to a wavelength of 13.5 nm of the absorption layer (14) is k>0.041, and the film thickness of the low reflective part (18) is a film thickness satisfying 0.5×da+dc≤21.5 nm or a film thickness satisfying 0.5×da+dc≥27.5 nm, wherein the film thickness of the absorption layer (14) is da and the film thickness of the outermost layer (15) is dc.

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First Claim