CONDUCTIVE C-PLANE GaN SUBSTRATE

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United States of America Patent

APP PUB NO 20240105449A1
SERIAL NO

18374744

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Abstract

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A conductive C-plane GaN substrate has a resistivity of 2×10−2 Ω·cm or less or an n-type carrier concentration of 1×1018 cm−3 or more at room temperature. At least one virtual line segment with a length of 40 mm can be drawn at least on one main surface of the substrate. The line segment satisfies at least one of the following conditions (A1) and (B1): (A1) when an XRC of (004) reflection is measured at 1 mm intervals on the line segment, a maximum value of XRC-FWHMs across all measurement points is less than 30 arcsec; and (B1) when an XRC of the (004) reflection is measured at 1 mm intervals on the line segment, a difference between maximum and minimum values of XRC peak angles across all the measurement points is less than 0.2°.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI CHEMICAL CORPORATION1-1 MARUNOUCHI 1-CHOME CHIYODA-KU TOKYO 100-8251

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
FUJISAWA, Hideo Tokyo, JP 33 139
KAWABATA, Shinichiro Kawasaki, JP 35 694
MIKAWA, Yutaka Tokyo, JP 36 168
MOCHIZUKI, Tae Tokyo, JP 16 40
NAMITA, Hideo Tokyo, JP 14 36

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