SURFACE TREATMENT METHOD TO REMOVE CONTAMINATED AND IMPLANTED WAVEGUIDE SURFACE
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United States of America Patent
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Issued Date -
Mar 28, 2024
app pub date -
Sep 22, 2023
filing date -
Sep 22, 2022
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Abstract
Embodiments of the present disclosure herein include a method of removing a contamination material from an optical device. The method may include disposing an optical device in a process chamber, the optical device having optical device structures formed in a substrate, the contamination material is disposed at least on sidewalls of the optical device structures and within trenches between the optical device structures, and exposing the optical device to a plasma generated in the process chamber, the plasma generated from oxygen gas (O2), chlorine gas (Cl2), Argon (Ar), or a combination thereof, the exposing the optical device to the plasma removes the contamination material.
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