Thermal plasma treatment method for sulfur hexafluoride degradation

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United States of America Patent

PATENT NO 12101868
APP PUB NO 20240098870A1
SERIAL NO

17948618

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The present disclosure discloses a thermal plasma treatment method for sulfur hexafluoride (SF6) degradation. In the thermal plasma treatment method for SF6 degradation, Ar is input into a thermal plasma generator as a carrier gas; annular electrodes are electrically connected to a direct current power supply to generate an arc plasma region in the presence of the carrier gas Ar; to-be-reacted SF6 and to-be-reacted H2 in a predetermined ratio are input into the arc plasma region to generate hydrogen radicals as well as fluorine radicals, and the hydrogen radicals and the fluorine radicals are bonded with each other to generate HF to inhibit the self-recovery reaction of SF6; and final products include HF and elemental S.

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Patent Owner(s)

Patent OwnerAddress
XI'AN JIAOTONG UNIVERSITY710049 NO 28 WEST XIANNING ROAD SHAANXI XI'AN XI'AN CITY SHAANXI PROVINCE 710049

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Guo, Yunshun Shaanxi, CN 1 0
Long, Hu Shaanxi, CN 5 1
Rong, Mingzhe Shaanxi, CN 31 37
Sun, Hao Shaanxi, CN 376 1303
Wu, Yi Shaanxi, CN 237 2485

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