SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Mar 21, 2024
app pub date -
Jul 26, 2023
filing date -
Sep 20, 2022
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
On a surface of a portion of a front electrode exposed in an opening of a passivation film, a Ni-deposited film having high solder wettability is provided apart from the sidewalls of the opening of the passivation film. Metal wiring is soldered to the Ni-deposited film. The solder layer is formed only on the Ni-deposited film and thus, the solder layer and the passivation film do not contact each other. The front electrode contains Al and an entire area of the surface of the front electrode excluding the portion where the Ni-deposited film is formed is covered by a surface oxide film that is constituted by an aluminum oxide film formed by intentionally oxidizing the surface of the front electrode. The surface oxide film intervenes between the front electrode, the passivation film, and a sealant, whereby the adhesive strength of the passivation film and the sealant is increased.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully