SEMICONDUCTOR PROCESS SYSTEM AND GAS TREATMENT METHOD
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United States of America Patent
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Issued Date -
Mar 21, 2024
app pub date -
Sep 14, 2023
filing date -
Sep 16, 2022
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
A gas treatment method, including: treating an exhaust gas discharged from a semiconductor process chamber using a gas treatment system; and discharging the treated exhaust gas, wherein the treating of the exhaust gas includes: operating a first thermal oxidizer to treat the exhaust gas discharged from the semiconductor process chamber, the first thermal oxidizer being connected to the semiconductor process chamber and allowing the treated exhaust gas to pass through a plasma processing apparatus connected to the first thermal oxidizer; stopping the operation of the first thermal oxidizer to perform maintenance on the first thermal oxidizer; and wherein the stopping the operation of the first thermal oxidizer comprises: performing maintenance on the first thermal oxidizer; and operating the plasma processing apparatus to treat the exhaust gas discharged from the semiconductor process chamber
First Claim
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