PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK
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United States of America Patent
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Issued Date -
Mar 21, 2024
app pub date -
Nov 29, 2023
filing date -
Jun 19, 2017
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Abstract
A method of making a semiconductor device includes forming at least one fiducial mark on a photomask. The method further includes defining a pattern including a plurality of sub-patterns on the photomask in a pattern region. The defining the pattern includes defining a first sub-pattern of the plurality of sub-patterns having a first spacing from a second sub-pattern of the plurality of sub-patterns, wherein the first spacing is different from a second spacing between the second sub-pattern and a third sub-pattern of the plurality of sub-patterns.
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