Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask

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United States of America Patent

PATENT NO 12001134
APP PUB NO 20240094622A1
SERIAL NO

18517796

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A reflective mask blank includes a substrate; a multilayer reflective film that reflects EUV light; a protection film that protects the multilayer reflective film; and a phase shift film that shifts a phase of the EUV light. The phase shift film contains it as a main component. A ratio of a maximum value of an intensity of a peak of diffracted light from the phase shift film in a 2θrange of 35° to 45° to an average value of an intensity of the diffracted light in a 28 range of 55° to 60° measured using an XRD method with a CuKα ray, upon being irradiated with the EUV light with an incident angle of θ, is 1.0 or more and 30 or less. A refractive index and an extinction coefficient of the phase shift film to the EUV light are 0.925 or less, and 0.030 or more, respectively.

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Patent Owner(s)

Patent OwnerAddress
AGC INC5-1 MARUNOUCHI 1-CHOME CHIYODA-KU TOKYO 100-8405

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Akagi, Daijiro Tokyo, JP 24 20
Iwaoka, Hiroaki Tokyo, JP 14 15
Nagata, Yuya Tokyo, JP 37 86
Sasaki, Kenichi Tokyo, JP 142 1548

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