GAS ANALYSIS DEVICE, FLUID CONTROL SYSTEM, GAS ANALYSIS PROGRAM, AND GAS ANALYSIS METHOD
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United States of America Patent
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Issued Date -
Mar 21, 2024
app pub date -
Sep 18, 2023
filing date -
Sep 21, 2022
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Abstract
The present invention brings an actual concentration of a process gas closer to an ideal concentration, and a gas analysis device that is used in a fluid control system that controls a process gas obtained by vaporizing a liquid material or a solid material, the gas analysis device including: a first concentration calculation unit that calculates a concentration of the process gas; a second concentration calculation unit that calculates a concentration of a by-product gas at least generated in a side reaction that is a reaction different from a main reaction for generating the process gas; a comparison unit that compares a first actual concentration that is the concentration of the process gas calculated by the first concentration calculation unit with a first ideal concentration, and compares a second actual concentration that is the concentration of the by-product gas calculated by the second concentration calculation unit with a second ideal concentration.
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