MODELING OF A DESIGN IN RETICLE ENHANCEMENT TECHNOLOGY
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United States of America Patent
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Mar 14, 2024
app pub date -
Nov 20, 2023
filing date -
Dec 22, 2017
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Abstract
Methods and systems for reticle enhancement technology (RET) include inputting a target wafer pattern, where the target wafer pattern spans an entire design area. The entire design area is divided into a plurality of tiles, each tile having a halo region surrounding the tile. An optimized mask is calculated, wherein the optimized mask is generated by a first trained neural network using the target wafer patter. The calculating is performed for each tile in the plurality of tiles including its halo region.
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