PROJECTION EXPOSURE APPARATUS AND METHOD FOR DESIGNING A COMPONENT OF A PROJECTION EXPOSURE APPARATUS

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United States of America Patent

APP PUB NO 20240085800A1
SERIAL NO

18507893

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Abstract

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A component for a projection exposure apparatus for semiconductor lithography, comprises an optical element and an actuator, which are force-fittingly connected to each other. The actuator at least locally deforms the optical element. The actuator can be configured to minimize the loss in rigidity at the peripheries delimiting the actuator on the imaging quality. A method for designing a component of projection exposure apparatus is provided.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS SMT GMBHRUDOLF-EBER-STRASSE 2 73447 OBERKOCHEN 73447

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bader, Dieter Oberkochen, DE 16 83
Baueregger, Stefan Oberkochen, DE 5 0
Beljakov, Andreas Oberkochen, DE 1 0
Duerr, Dietmar Oberkochen, DE 3 2
Keller, Bastian Oberkochen, DE 3 0
Manger, Matthias Oberkochen, DE 42 92
Ostendorf, Alexander Oberkochen, DE 3 0
Pollak, Thilo Oberkochen, DE 7 2
Raab, Markus Oberkochen, DE 25 272
Schrezenmeier, Irina Oberkochen, DE 2 0
Tschischgale, Joerg Oberkochen, DE 7 43

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