METHOD AND APPARATUS FOR QUALIFYING A MASK FOR USE IN LITHOGRAPHY
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United States of America Patent
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Issued Date -
Mar 14, 2024
app pub date -
Sep 8, 2023
filing date -
Sep 9, 2022
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Abstract
A method for qualifying a mask for use in lithography is proposed. The method includes the following steps: a provision of an apparatus for qualifying a mask, the apparatus comprising an optical system and an evaluation and control device; a detection of at least one first phase difference of light at the mask by use of the optical system and the evaluation and control device; loading the mask; detecting at least one second phase difference of light at the mask by use of the optical system and the evaluation and control device; and implementing a comparison of the first phase difference with the second phase difference by use of the evaluation and control device.
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