APPARATUS FOR MANUFACTURING ANALYTICAL SEMICONDUCTOR SAMPLES AND METHOD FOR MANUFACTURING ANALYTICAL SEMICONDUCTOR SAMPLES BY USING THE SAME
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United States of America Patent
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Issued Date -
Mar 14, 2024
app pub date -
Aug 23, 2023
filing date -
Sep 8, 2022
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Abstract
There is provide a method for manufacturing analytical semiconductor samples by using an apparatus for manufacturing analytical semiconductor samples, which minimizes a feedback time by manufacturing a viewing surface that is environment-friendly and has a large area. The method comprising mounting the analytical semiconductor samples to a holder; discharging deionized (DI) water to an upper surface of a polishing plate through a DI water nozzle; grinding the analytical semiconductor samples with the upper surface of the polishing plat; determining whether a desired viewing surface of the analytical semiconductor samples has been acquired after the grinding of the analytical semiconductor samples; and transferring the analytical semiconductor samples to analyze the viewing surface of the ground analytical semiconductor samples based on a determination that the desired viewing surface of the analytical semiconductor samples has been acquired.
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