MASK FORMING SYSTEM FOR PROTECTING A STRUCTURE AND A METHOD OF FORMING A MASK FOR THE SAME
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United States of America Patent
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Issued Date -
Mar 14, 2024
app pub date -
Sep 5, 2023
filing date -
Sep 9, 2022
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Abstract
A mask forming system for protecting a structure and a method of forming a mask for protecting the structure includes a masking material having a first layer, a second layer, and a third layer sandwiched together. The masking material is unrolled across a platform and a plurality of features are generated in the masking material, wherein the features include printing, kiss cutting, and double-kiss cutting the masking material. Data is printed on the first layer of the masking material. The first layer of the masking material is kiss cut. The second layer of the masking material is double-kiss cut. The third layer remains uncut and unprinted on during the formation of the mask. The masking material remains in the same orientation during printing and kiss cutting of the first layer, and the masking material remains in the same orientation during double-kiss cutting of the second layer.
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