PLASMA-ASSISTED ANNEALING SYSTEM AND METHOD
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United States of America Patent
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Mar 7, 2024
app pub date -
Dec 12, 2022
filing date -
Sep 1, 2022
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Abstract
A plasma-assisted annealing system includes a high temperature furnace, a plasma-induced dissociator and a connecting duct. The plasma-induced dissociator is provided to dissociate a working gas and exhaust the dissociated working gas from its working gas outlet. Both ends of the connecting duct are connected to the working gas outlet of the plasma-induced dissociator and a gas inlet of the high temperature furnace, respectively. The working gas dissociated in the plasma-induced dissociator is introduced into the high temperature furnace via the connecting duct.
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