HIGH EFFICIENCY PLASMA CREATION SYSTEM AND METHOD

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20240074025A1
SERIAL NO

18387942

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A chamber cross-sectional multi-stage plasma arrangement characterized by escalating charge movement towards chamber center axis through one or more escalation stages contributing to the heating of the plasma, the centering of the plasma on the chamber axis, and creating rotation of the plasma therein. Rotation of the plasma around its axis induces a self-generated magnetic field, which in turn increases plasma stability and confinement. Some of the said stages of the multi-stage arrangement may be created by physical elements and components while others may be induced or generated by externally applying magnetic and/or electric fields or their combinations and/or by injection of electrons, ions or other plasma.

First Claim

See full text

loading....

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
N T TAO LTD3 HANAGAR STREET 4501306 HOD HASHARON 4501306

International Classification(s)

loading....
  • 2023 Application Filing Year
  • H05H Class
  • 176 Applications Filed
  • 37 Patents Issued To-Date
  • 21.03 % Issued To-Date

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
GOUR, LAVIE Oded Ein Iron, IL 2 1
WEINFELD, Boaz Jerusalem, IL 9 71
WEINFELD, Doron Jerusalem, IL 5 5

Cited Art Landscape

Load Citation

Patent Citation Ranking

  • 0 Citation Count
  • H05H Class
  • 0 % this patent is cited more than
  • 1 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges382701 - 100255075100125150175200225250275300325350375400425

Forward Cite Landscape

Load Citation