HIGH EFFICIENCY PLASMA CREATION SYSTEM AND METHOD
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Issued Date -
Feb 29, 2024
app pub date -
Nov 8, 2023
filing date -
Mar 22, 2021
priority date (Note) -
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Abstract
A chamber cross-sectional multi-stage plasma arrangement characterized by escalating charge movement towards chamber center axis through one or more escalation stages contributing to the heating of the plasma, the centering of the plasma on the chamber axis, and creating rotation of the plasma therein. Rotation of the plasma around its axis induces a self-generated magnetic field, which in turn increases plasma stability and confinement. Some of the said stages of the multi-stage arrangement may be created by physical elements and components while others may be induced or generated by externally applying magnetic and/or electric fields or their combinations and/or by injection of electrons, ions or other plasma.
First Claim
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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
N T TAO LTD | 3 HANAGAR STREET 4501306 HOD HASHARON 4501306 |
International Classification(s)

- 2023 Application Filing Year
- H05H Class
- 176 Applications Filed
- 37 Patents Issued To-Date
- 21.03 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
GOUR, LAVIE Oded | Ein Iron, IL | 2 | 1 |
# of filed Patents : 2 Total Citations : 1 | |||
WEINFELD, Boaz | Jerusalem, IL | 9 | 71 |
# of filed Patents : 9 Total Citations : 71 | |||
WEINFELD, Doron | Jerusalem, IL | 5 | 5 |
# of filed Patents : 5 Total Citations : 5 |
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- 0 Citation Count
- H05H Class
- 0 % this patent is cited more than
- 1 Age
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